Structural, Optical and Decorative Properties of TaNx Thin Films Prepared by Reactive Magnetron Sputtering

Abstract

Within the frame of this work, the tantalum nitride - TaNx thin films were deposited by d.c. reactive magnetron sputtering. These films have been characterized in terms of optical, decorative, and structural properties taking into account the influence of reactive gas flow variation (N2) during the deposition procedures. Different colors were obtained, from metalliclike to silver-like tones and they are directly correlated with the deposition conditions, respectively, with the structure. The structure was assessed using X-ray diffraction. The results showed clear changes in phases in the films from typical fcc TaN structure to stoichiometric fcc (face-centered cubic) TaN and amorphous TaN.