Overview on Pulsed Laser Deposition of Chalcogenide-Based Thin Films

Abstract

The application of pulsed laser deposition methods for chalcogenide-based amorphous thin film preparation is also described and current state-of-the-art is reviewed. These methods are based on vacuum evaporation of material by intensive laser pulses and subsequent deposition of vapors on a substrate and are very promising for thin film preparation of complex composition materials. The deposition in a non-inert (reactive) atmosphere is possible. Low volatility and refractory materials can be also deposited without decomposition. The optical properties of obtained films are highlighted.