The Influence of Additives on WO3 Thin Film Deposition

Authors

  • A. Enesca Transilvania University of Brasov, Romania
  • A. Duta Transilvania University of Brasov, Romania
  • J. Schoonman Transilvania University of Brasov, Romania; Technical University of Delft, The Netherlands

Keywords:

tungsten trioxide, additives, nanostructured

Abstract

The aim of the papers is to describe the influence of the additives on the process of film formation. The thermal reactions were investigated using DSC analysis, and the crystalline structure of the samples was revealed via XRD studies. The conductivity behavior depends on various factors investigated in the I-V graphics. Finally, the concentration of defect density was determined by impedance analysis.

Author Biographies

A. Enesca, Transilvania University of Brasov, Romania

Chemistry Dept.

A. Duta, Transilvania University of Brasov, Romania

Chemistry Dept.

Published

2007-01-17

Issue

Vol. 12(47) (2005)

Section

MATERIALS PROCESSING